Opticalbandgap相关论文
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The glass forming region of Bi_2O_3-B_2O_3-BaO ternary system was investigated.A serial of glass samples with high Bi2O3......
Cr2O3 thin films were prepared on Al2O3 substrate by the atmospheric pressure CVD method at a low deposition temperature......
We have successfully prepared Cu-Al-O thin films on silicon (100) and quartz substrates by RF magnetron sputtering metho......
Effects of the distance between the inductance coil and substrates on the microstructure and optical
Inductively coupled plasma (ICP) system with the adjustable distance (d) between the inductance coil and substrates was ......
在蓝宝石衬底上制备了具有不同铝(Al)掺杂浓度的掺铝氧化锌(AZO)薄膜, 并对其进行了紫外-可见吸收光谱、霍尔效应、折射率及介电常......
采用射频磁控溅射法制备了用于液晶光阀光敏层的a-Si1-x(CdTe)x∶H薄膜。研究了CdTe含量对氢化非晶硅薄膜光学性能的影响。采用扫......
Ultrathin Ge films with thickness of about 15 nm at different deposition temperatures were prepared by electron beam eva......
利用传统熔融-淬冷工艺制备了65GeS2-15Ga2S3-(20-x)CsCl-xCsI(x=0, 5, 10, 15, 20)系列硫卤玻璃；通过测试该系列玻璃样品的密度、......
为获得高质量的远红外硫系玻璃, 采用传统的真空熔融淬冷法配合真空低温固化技术制备了高卤素含量的Te硫系玻璃(卤素Imax=40 at.%)......
采用熔融淬冷法制备了新型远红外Te基硫系玻璃Ge20-xTe65Se15Snx (x=0，2，4)。在Ge-Te-Se玻璃的基础上，通过引入重金属Sn,研究其对玻璃......
在不同氨分压比(0~30%)下，用射频磁控溅射法在玻璃和硅衬底上制备了N掺杂β-Ga2O3薄膜.研究了氨分压比和退火对薄膜光学和结构特性......
